Publication Energy Harvesting Laboratory

Publication

“Selective Etching of HfO2 by Using Inductively-Coupled Ar/C4F8 Plasmas and the Removal of Etch Residue on Si by Using an O2 Plasma Treatment“
Journal
Journal of the Korean Physical Society
Author
K. S. Min, B. J. Park, S. W. Kim and S. K. Kang
Volume, Page (Number)
Vol 53(3), p.1675-1679
Year
2008
File
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